Category:
Theoretical and Computational Chemistry
,
Working Paper
, Title:
Microscopic deprotection mechanisms and acid loss pathways of chemically amplified photoresists for deep/extreme ultraviolet photolithography
, Authors:
Hong Du, Zilin Wang, Hanshen Xin, Jie Xue, Jianhua Zhang, Haoyuan Li
Version 2 posted 02 July 2024
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