Abstract
Organic-inorganic hybrid materials are a unique
class of materials with properties driven by the organic and inorganic
components, making them useful for flexible devices. Molecular layer deposition
(MLD) offers novel pathways for the fabrication of such hybrids by using
inorganic metal precursors and the vast range of organic molecules with tunable
properties. To investigate and understand the mechanism of growth a combination
of theoretical and experimental data is needed. In this contribution, we
present a first principles investigation of the molecular mechanism of the
growth of hybrid organic−inorganic thin films of aluminium alkoxides, known as
“alucones” grown by MLD. We explore the
interactions between precursors by analyzing the MLD reaction products of the
alumina surface terminated with Al(CH3) groups after the trimethyl
aluminium pulse; this yields monomethyl-Al2O3 (Al-CH3-Al2O3)
and dimethyl- Al2O3 (Al(CH3)2- Al2O3)
terminated surfaces. The organic precursors are ethylene glycol (EG),
diethylene glycol (DEG), triethylene glycol (TEG) and tetraethylene glycol
(FEG). A detailed comparison with alucones grown with ethylene glycol (EG) and
glycerol (GL) precursors is presented to assist the interpretation of experimental
findings regarding the differences in the hybrid films grown by EG and GL. The
results show that Al-O formation with release of methane is favorable for all
precursors. EG and GL can lie flat and create so-called double reactions
through the reaction of the two terminal hydroxyl groups with the surface
fragments. This phenomenon removes active hydroxyl sites for EG. However, for
GL the third hydroxyl group is available and growth can proceed. This analysis
shows the origin of differences in thickness of alucones found for EG and GL.